A semiconductor wafer passes through a series of tightly controlled processes before it becomes the chips used in phones, vehicles, medical equipment and data centres.
One of those processes is wet chemical cleaning. Aggressive chemicals clean the surface of the wafer while it rotates and moves vertically inside the machine. The movement must be smooth, stable and accurate to within microns.
Even a tiny unwanted movement or particle can affect the quality of the wafer and the manufacturing stages that follow. The motion technology must also fit into a confined space and continue working reliably throughout high volume production. KML developed its Drive and Elevating Unit to meet these demands inside single wafer wet cleaning equipment.
Combining two movements in one compact unit
The Drive and Elevating Unit, known as the DEU, combines rotary and vertical movement within one compact electromechanical subsystem. Put simply, it turns and lifts the wafer while keeping its position precisely controlled.
The engineering challenge was easy to describe but much harder to solve. How could KML combine both movements in a small space without compromising cleanliness, reliability or performance?
Its engineers brought torque and linear motor technologies together in a single unit. A rigid cast base provides a stable foundation, while precision bearings, direct drives and specialist guides control the movement under dynamic loads.
Every detail has a purpose. Special lubricants keep the movement smooth. Protective surface coatings help components withstand aggressive chemicals. Vacuum chambers suppress particles that could otherwise interfere with the wafer cleaning process.
“Good motion technology should become part of the customer’s process without creating another problem for them,” says Patrick de Groot, CEO Aalberts dvanced mechatronics. “The wafer needs to move exactly as intended, every time, without the unit adding particles or instability.”
Tested for reliable semiconductor production
The DEU must maintain micron level concentricity while generating as few particles as possible. It also needs to deliver the same movement repeatedly during constant production.
Every unit is functionally tested before delivery to confirm its stability and repeatability. The resulting combination of rigidity, precision and durability supports almost 100 per cent machine availability and a long service life.
The design has continued to evolve as semiconductor manufacturing has become more demanding. Producing smaller and more advanced chips requires equipment to become more precise, while still operating reliably at the volumes manufacturers need.
A small movement with a much wider impact
Most people will never see a Drive and Elevating Unit. It sits deep inside the equipment used to manufacture semiconductors. Yet its performance helps determine how consistently wafers can be cleaned and, in turn, the quality of the chips produced.
Those chips go on to support artificial intelligence, healthcare, mobility and the digital infrastructure people use every day. For machine builders, the DEU provides a compact subsystem they can rely on in one of the most demanding parts of semiconductor production.
By bringing precision engineering, material knowledge and motion technology together, KML keeps wafers moving exactly as required. It is a small and carefully controlled movement that helps keep a much bigger process running.
Facts & figures
- 2 movements in 1: Rotary and vertical wafer movement combined in one compact unit
- Micron-level precision: Maintains highly accurate, controlled wafer movement
- ~100% machine availability: Supports continuous semiconductor production
- 100% tested: Every DEU is functionally tested before delivery
- Particle control: Vacuum chambers and specialist components help minimise particle generation
- Long service life: Designed for reliable operation in high-volume semiconductor manufacturing